Title: Effect of size and plasma treatment and the application of Weibull distribution on the breakdown of PECVD SiNx MIM capacitors
Authors: Ho, Chia-Cheng
Chiou, Bi-Shiou
Innovative Packaging Research Center
Department of Electronics Engineering and Institute of Electronics
Innovative Packaging Research Center
Keywords: Weibull distribution;weakest-link theory;plasma treatment;electric field
Issue Date: 1-Jan-2008
Abstract: The dielectric breakdown field is one of the important concerns for device reliability. The breakdown of dielectric is originated at a fatal flaw that grows to cause failure and can be explained by the weakest-link theory. In this study, metal-insulator-metal (MIM) capacitors with plasma enhanced chemical vapor deposited (PECVD) SiNx are prepared. Ammonia (NH3) plasmas are applied after the deposition of the dielectric SiNx. The Weibull distribution function, which is based on the weakest-link theory, is employed to analyze the effect of the electrode area as well as the plasma treatment on the breakdown of the MIM capacitors. The time dependent dielectric breakdown testing indicates a decrease in both the leakage current and the lifetime of the MIM capacitors treated with plasma. Possible dielectric degradation mechanisms are explored. (C) 2007 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2007.04.151
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.04.151
Volume: 85
Issue: 1
Begin Page: 110
End Page: 114
Appears in Collections:Conferences Paper

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