標題: Control system design for a rapid thermal processing system
作者: Lin, CA
Jan, YK
電控工程研究所
Institute of Electrical and Control Engineering
關鍵字: output feedback;proportional plus integral (PI) controller;rapid thermal processing (RTP);reduced order system;single-wafer process;temperature control;temperature measurement
公開日期: 1-一月-2001
摘要: This paper proposes a control system design for a rapid thermal processing (RTP) system, which has four circular concentric lamp zones and four temperature sensors. The control system consists of a least square feedforward controller and an output feedback proportional plus integral (PI) controller. The goal is to maintain uniform temperature tracking for typical ramp-up and hold-steady profiles. A high-order nonlinear model describing the temperature dynamics of the rapid thermal processing (RTP) system is used for the feedforward controller design. A balanced reduced model, obtained from a linear model around a desired uniform steady-state temperature, is used for the design of the multiinput-multioutput (MIMO) PI controller. The PI controller gain matrices are designed using an LQR-based procedure. Tradeoff between robustness and performance of the system is discussed, Simulation results show the control system designed yields robust temperature tracking with good uniformity for a wide temperature range.
URI: http://dx.doi.org/10.1109/87.896753
http://hdl.handle.net/11536/29999
ISSN: 1063-6536
DOI: 10.1109/87.896753
期刊: IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY
Volume: 9
Issue: 1
起始頁: 122
結束頁: 129
顯示於類別:期刊論文


文件中的檔案:

  1. 000166627500015.pdf