標題: Optical disk mastering using optical superresolution technique
作者: Shieh, HPD
Tsai, SY
Peng, YH
Hsieh, TE
材料科學與工程學系
光電工程學系
Department of Materials Science and Engineering
Department of Photonics
關鍵字: disk mastering;thermal-induced superresolution;lithography
公開日期: 1-Mar-2001
摘要: A new laser lithography technique using the effect of optical superresolution can effectively reduce the exposed spot size on a photoresist layer, thus allowing disk mastering toward higher density using an existing light source and optics. A thin metallic mask layer deposited on the top of the photoresist layer is used to obtain a "below optical diffraction limit" linewidth on the photoresist layer. The feasibility of the laser lithography technique, as evaluated by simulation and experimental results, revealed that the linewidth on the photoresist layer could be shrunk by more than 50% of the diffraction limit of the optical system.
URI: http://dx.doi.org/10.1143/JJAP.40.1671
http://hdl.handle.net/11536/29801
ISSN: 0021-4922
DOI: 10.1143/JJAP.40.1671
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 40
Issue: 3B
起始頁: 1671
結束頁: 1675
Appears in Collections:Conferences Paper


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