標題: Mask films for thermally induced superresolution readout in rewritable phase-change optical disks
作者: Lu, YH
Dimitrov, D
Liu, JR
Hsieh, TE
Shieh, HPD
材料科學與工程學系
光電工程學系
Department of Materials Science and Engineering
Department of Photonics
關鍵字: gerasable phase change;mask films;thermally induced superresolution readout;cyclability;tellurium
公開日期: 1-Mar-2001
摘要: Tellurium was studied as a mask film in a thermally induced superresolution rewritable optical disk for detecting below-diffraction-limit marks. Mark trains of 0.15 mum could be retrieved with 9 dB in carrier-to-noise (CNR) using an optical system with the laser wavelength of 780 nm and an objective lens of 0.55 numerical aperture. Readout cyclability was examined and methods to further improve readout cyclability were proposed.
URI: http://dx.doi.org/10.1143/JJAP.40.1647
http://hdl.handle.net/11536/29800
ISSN: 0021-4922
DOI: 10.1143/JJAP.40.1647
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 40
Issue: 3B
起始頁: 1647
結束頁: 1648
Appears in Collections:Conferences Paper


Files in This Item:

  1. 000170771600031.pdf