標題: THICKNESS DETERMINATION OF POLY-SI/POLY-OXIDE POLY-SI/SIO2/SI STRUCTURE BY ELLIPSOMETER
作者: CHAO, TS
LEE, CL
LEI, TF
電控工程研究所
Institute of Electrical and Control Engineering
關鍵字: MEASUREMENT;THIN FILMS;ELLIPSOMETRY
公開日期: 24-六月-1993
摘要: An ellipsometry measurement method is proposed to measure the poly-Si/poly-oxide/poly-Si/SiO2/Si structure. The thickness of each layer in this structure can be easily obtained by a conventional ellipsometry measurement. The measured result is consistent with that of cross-sectional TEM.
URI: http://hdl.handle.net/11536/2977
ISSN: 0013-5194
期刊: ELECTRONICS LETTERS
Volume: 29
Issue: 13
起始頁: 1157
結束頁: 1159
顯示於類別:期刊論文


文件中的檔案:

  1. A1993LW31600007.pdf