Title: THICKNESS DETERMINATION OF POLY-SI/POLY-OXIDE POLY-SI/SIO2/SI STRUCTURE BY ELLIPSOMETER
Authors: CHAO, TS
LEE, CL
LEI, TF
電控工程研究所
Institute of Electrical and Control Engineering
Keywords: MEASUREMENT;THIN FILMS;ELLIPSOMETRY
Issue Date: 24-Jun-1993
Abstract: An ellipsometry measurement method is proposed to measure the poly-Si/poly-oxide/poly-Si/SiO2/Si structure. The thickness of each layer in this structure can be easily obtained by a conventional ellipsometry measurement. The measured result is consistent with that of cross-sectional TEM.
URI: http://hdl.handle.net/11536/2977
ISSN: 0013-5194
Journal: ELECTRONICS LETTERS
Volume: 29
Issue: 13
Begin Page: 1157
End Page: 1159
Appears in Collections:Articles


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  1. A1993LW31600007.pdf