標題: Internal stresses and microstructures of commercial thick diamond films deposited by different deposition methods
作者: Kuo, CT
Wu, JY
Lin, CH
Lu, TR
Sung, CM
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: plasma-assisted CVD;mechanical properties;X-ray diffraction;optical properties
公開日期: 1-Nov-2001
摘要: Structures and stress state of six commercial freestanding thick diamond films (> 300 mum) were analyzed by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and Raman spectroscopy. These films represent the typical samples synthesized by three different chemical vapor deposition (CVD) methods, including DC are, microwave plasma, and hot filament. It was found that the higher diamond deposition rate it reaches, the more non-diamond carbons it contains, and the larger the residual compressive stress it possesses. Moreover, the samples with the highest degree of optical transparency are under the lowest compressive stress. These crystal characteristics can be manipulated by selecting different deposition methods and parameters that affect nucleation rate and growth rate of diamond. The present results show that the DC are method gives poorly developed crystals, and its residual compressive stress of the films is the highest due to the fastest diamond nucleation and crystal growth rates. (C) 2001 Elsevier Science B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/S0254-0584(01)00418-7
http://hdl.handle.net/11536/29258
ISSN: 0254-0584
DOI: 10.1016/S0254-0584(01)00418-7
期刊: MATERIALS CHEMISTRY AND PHYSICS
Volume: 72
Issue: 2
起始頁: 114
結束頁: 120
Appears in Collections:Conferences Paper


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