標題: Azimuth alignment in photoelastic modulation ellipsometry at a fixed incident angle
作者: Wang, MW
Chao, YF
光電工程學系
Department of Photonics
關鍵字: ellipsometry;alignment;photoelastic modulator
公開日期: 1-六月-2002
摘要: A high intensity ratio technique is proposed to align all the azimuthal angles of a photoelastic modulation ellipsometric system in a fixed incident angle. This technique is used to determine the azimuthal orientations of the polarizer, the photoelastic modulator and the analyzer to the incident plane, Two pre-designed testing samples and two probing wavelengths for a thin film are introduced to locate the incident plane by the intensity ratio technique in a polarizer-sample-analyzer ellipsometric setup. Then, the azimuth of the pholoelastic modulator is directly obtained from two DC radiances separated by 45degrees. In addition to azimuth deviation, the ellipsometric parameter psi can also be determined from the same measurement for determining the incident angle on-line.
URI: http://dx.doi.org/10.1143/JJAP.41.3981
http://hdl.handle.net/11536/28746
ISSN: 0021-4922
DOI: 10.1143/JJAP.41.3981
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 41
Issue: 6A
起始頁: 3981
結束頁: 3986
顯示於類別:期刊論文


文件中的檔案:

  1. 000177169500074.pdf