Title: Azimuth alignment in photoelastic modulation ellipsometry at a fixed incident angle
Authors: Wang, MW
Chao, YF
光電工程學系
Department of Photonics
Keywords: ellipsometry;alignment;photoelastic modulator
Issue Date: 1-Jun-2002
Abstract: A high intensity ratio technique is proposed to align all the azimuthal angles of a photoelastic modulation ellipsometric system in a fixed incident angle. This technique is used to determine the azimuthal orientations of the polarizer, the photoelastic modulator and the analyzer to the incident plane, Two pre-designed testing samples and two probing wavelengths for a thin film are introduced to locate the incident plane by the intensity ratio technique in a polarizer-sample-analyzer ellipsometric setup. Then, the azimuth of the pholoelastic modulator is directly obtained from two DC radiances separated by 45degrees. In addition to azimuth deviation, the ellipsometric parameter psi can also be determined from the same measurement for determining the incident angle on-line.
URI: http://dx.doi.org/10.1143/JJAP.41.3981
http://hdl.handle.net/11536/28746
ISSN: 0021-4922
DOI: 10.1143/JJAP.41.3981
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 41
Issue: 6A
Begin Page: 3981
End Page: 3986
Appears in Collections:Articles


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