標題: Mechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresist
作者: Chen, JK
Ko, FH
Chen, HL
Chang, FC
應用化學系
Department of Applied Chemistry
關鍵字: zwitterresist;electron beam;heating effect;ring pattern;throughput
公開日期: 1-Jun-2003
摘要: The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 muC/cm(2), while it could be neglected at less than 600 muC/cm(2). Mathematical modeling for the prediction of ring width for zwitterresist, was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.
URI: http://dx.doi.org/10.1143/JJAP.42.3838
http://hdl.handle.net/11536/27815
ISSN: 0021-4922
DOI: 10.1143/JJAP.42.3838
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 42
Issue: 6B
起始頁: 3838
結束頁: 3841
Appears in Collections:Conferences Paper


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