Full metadata record
DC FieldValueLanguage
dc.contributor.authorHuang, CHen_US
dc.contributor.authorHo, YTen_US
dc.contributor.authorTsai, CJen_US
dc.date.accessioned2014-12-08T15:39:08Z-
dc.date.available2014-12-08T15:39:08Z-
dc.date.issued2004-06-01en_US
dc.identifier.issn0149-6395en_US
dc.identifier.urihttp://dx.doi.org/10.1081/SS-120039319en_US
dc.identifier.urihttp://hdl.handle.net/11536/26746-
dc.description.abstractA method for sampling inorganic acids in the exhaust gas of semiconductor and optoelectronic industries was developed by using a porous metal denuder and an ion chromatograph analysis. The sampler consists of a Teflon filter to collect inorganic acidic aerosols followed by two coated porous metal discs for sampling inorganic acidic gases. The second disc was used to check if the gas broke through the first disc. The method detection limit of the sampler is appropriate for sampling the exhausted gas at semiconductor or photoelectric industries. Test results indicated that the calibration curves had good coefficients of correlation, and the concentrations of the laboratory and field blanks were found to be lower than the method detection limit. For the semiconductor and optoelectronic industries, the total concentration of acidic gases and particles for hydrofluoric acid, hydrochloric acid, nitric acid, phosphoric acid, and sulfuric acid was found to be 85-999, 40-820, 21-223, ND (not detectable) -404, and 49-535 mug/Nm(3) (at 0degreesC, 1 atm), respectively, by using the new method. The porous metal denuder is compact in size, sensitive in detection, and suitable for sampling several inorganic acids simultaneously in the exhausted gas for the semiconductor or photoelectric industries.en_US
dc.language.isoen_USen_US
dc.subjectinorganic acidsen_US
dc.subjectsemiconductor and optoclectronic industriesen_US
dc.subjectporous metal denuderen_US
dc.subjectDetection limiten_US
dc.titleMeasurement of inorganic acidic gases and particles from the stack of semiconductor and optoelectronic industriesen_US
dc.typeArticleen_US
dc.identifier.doi10.1081/SS-120039319en_US
dc.identifier.journalSEPARATION SCIENCE AND TECHNOLOGYen_US
dc.citation.volume39en_US
dc.citation.issue9en_US
dc.citation.spage2223en_US
dc.citation.epage2234en_US
dc.contributor.department環境工程研究所zh_TW
dc.contributor.departmentInstitute of Environmental Engineeringen_US
dc.identifier.wosnumberWOS:000223227700013-
dc.citation.woscount0-
Appears in Collections:Articles


Files in This Item:

  1. 000223227700013.pdf