標題: High-performance bulk and thin-film microstrip transmission lines on VLSI-standard Si substrates
作者: Chen, CC
Hung, BF
Chin, A
McAlister, SP
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: microstrip lines;Si;ion implantation;CPW;thin-film;VLSI
公開日期: 20-十月-2004
摘要: Microstrip transmission lines with very low power loss of 0.4 dB/mm at 50 GHz have been fabricated on Si substrates using an optimized ion-implantation process. These devices have the inherent advantages of smaller chip Size and better power performance than CPW lines. Using the same approach, high-performance thin-film microstrip lines are also developed, showing a loss of 0.9 dB/mm at 20 GHz. This approach is compatible with existing VLSI backend layout technology. (C) 2004 Wiley Periodicals, Inc.
URI: http://dx.doi.org/10.1002/mop.20404
http://hdl.handle.net/11536/25746
ISSN: 0895-2477
DOI: 10.1002/mop.20404
期刊: MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
Volume: 43
Issue: 2
起始頁: 148
結束頁: 151
顯示於類別:期刊論文


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  1. 000223815300020.pdf