標題: Broadband and omnidirectional antireflection from conductive indium-tin-oxide nanocolumns prepared by glancing-angle deposition with nitrogen (Retracted article. See vol. 104, 269901, 2014)
作者: Chang, C. H.
Yu, Peichen
Yang, C. S.
光電工程學系
Department of Photonics
關鍵字: antireflection coatings;electron beam deposition;indium compounds;nanostructured materials;semiconductor growth;semiconductor materials
公開日期: 2-Feb-2009
摘要: Characteristic formation of highly oriented indium-tin-oxide (ITO) nanocolumns is demonstrated using electron-beam evaporation with an obliquely incident nitrogen flux. The nanocolumn material exhibits broadband and omnidirectional antireflective characteristics up to an incidence angle of 70 degrees for the 350-900 nm wavelength range for both s- and p-polarizations. Calculations based on a rigorous coupled-wave analysis indicate that the superior antireflection arises from the tapered column profiles which collectively function as a gradient-index layer. Since the nanocolumns have a preferential growth direction which follows the incident vapor flux, the azimuthal and polarization dependence of reflectivities are also investigated. The single ITO nanocolumn layer can function as antireflection contacts for light emitting diodes and solar cells.
URI: http://dx.doi.org/10.1063/1.3079329
http://hdl.handle.net/11536/24982
ISSN: 0003-6951
DOI: 10.1063/1.3079329
期刊: APPLIED PHYSICS LETTERS
Volume: 94
Issue: 5
結束頁: 
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