標題: Resistive switching characteristics of Pt/CeOx/TiN memory device
作者: Ismail, Muhammad
Talib, Ijaz
Huang, Chun-Yang
Hung, Chung-Jung
Tsai, Tsung-Ling
Jieng, Jheng-Hong
Chand, Umesh
Lin, Chun-An
Ahmed, Ejaz
Rana, Anwar Manzoor
Nadeem, Muhammad Younus
Tseng, Tseung-Yuen
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-六月-2014
摘要: The resistive switching characteristics of Pt/CeOx/TiN memory devices are investigated for potential applications in nonvolatile resistive random access memory (RRAM). The X-ray diffraction characteristics of the sputtered CeOx layer indicate the formation of nanocrystalline single-phase CeO2 with a cubic fluorite structure. The existence of oxygen vacancies in the Pt/CeOx/TiN memory device was determined by X-ray photoelectron spectroscopic studies, while the presence of an interfacial layer between CeOx and the TiN bottom electrode was investigated by Xray diffraction and high resolution transmission electron microscopy. The TiON layer formed at the TiN/CeOx interface seems to play a key role in the resistive switching mechanism of the device. The present CeOx-based device shows excellent bipolar resistive switching characteristics, including a low operation current (100 mu A), high ON/OFF resistance ratio (similar to 10(5)), and good retention/stress characteristics at both room temperature and 85 degrees C. (C) 2014 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.7567/JJAP.53.060303
http://hdl.handle.net/11536/24666
ISSN: 0021-4922
DOI: 10.7567/JJAP.53.060303
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 53
Issue: 6
結束頁: 
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