標題: A simulation model on photoresist SU-8 thickness after development under partial exposure with reflection effect
作者: Huang, Yuan-Te
Hsu, Wensyang
機械工程學系
Department of Mechanical Engineering
公開日期: 1-三月-2014
摘要: The negative photoresist SU-8 is often used to fabricate thick micro structures. It was known that reflection from the interface between SU-8 and the substrate surface would affect the thickness after development and profile of SU-8 structures. However, the model to predict the thickness after development of SU-8 under reflection effect has not been reported yet. Here, a simulation model to predict SU-8 thickness after development under partial exposure with reflection effects is proposed. Two kinds of SU-8 micro structures with different exposure dosages and coated thickness are fabricated on glass substrates to demonstrate the Capability of the proposed model. For different exposure dosages or coated SU-8 thickness, the maximum difference between simulated and experimental results is shown to be less than 3.1%, which verifies the accuracy of the proposed model. (C) 2014 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.7567/JJAP.53.036505
http://hdl.handle.net/11536/24498
ISSN: 0021-4922
DOI: 10.7567/JJAP.53.036505
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 53
Issue: 3
結束頁: 
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  1. 000336118300057.pdf