標題: DEPOSITION OF MOLYBDENUM CARBONITRIDE THIN-FILMS FROM MO(NBUT)2(NHBUT)2
作者: CHIU, HT
HO, WY
CHUANG, SH
交大名義發表
應用化學系
National Chiao Tung University
Department of Applied Chemistry
公開日期: 1-七月-1994
摘要: Mo(NBut)2(NHBut)2 is used as a single-source precursor to deposit thin films of cubic phase molybdenum carbonitride, MoC(x)N(y), (x: 0.2-0.55, y: 0.1-0.47), by chemical vapor deposition on silicon substrates. in general, the C/Mo ratios increased from 0.2 to 0.55 and the N/Mo ratios decreased from 0.47 to 0.1 with increasing the temperature of deposition from 773 to 923 K. Based on the elemental composition and the composition of the gas phase products, it is proposed that the carbon atoms were incorporated through beta-methyl activation of the ligands.
URI: http://hdl.handle.net/11536/2433
ISSN: 0884-2914
期刊: JOURNAL OF MATERIALS RESEARCH
Volume: 9
Issue: 7
起始頁: 1622
結束頁: 1624
顯示於類別:期刊論文


文件中的檔案:

  1. A1994NU76000003.pdf