標題: Artificial sunlight and ultraviolet light induced photo-epoxidation of propylene over V-Ti/MCM-41 photocatalyst
作者: Van-Huy Nguyen
Lin, Shawn D.
Wu, Jeffrey Chi-Sheng
Bai, Hsunling
環境工程研究所
Institute of Environmental Engineering
關鍵字: artificial sunlight;light irradiation effects;photo-epoxidation;ultraviolet (UV) light;V-Ti/MCM-41 photocatalyst
公開日期: 5-五月-2014
摘要: The light irradiation parameters, including the wavelength spectrum and intensity of light source, can significantly influence a photocatalytic reaction. This study examines the propylene photo-epoxidation over V-Ti/MCM-41 photocatalyst by using artificial sunlight (Xe lamp with/without an Air Mass 1.5 Global Filter at 1.6/18.5 mW.cm(-2)) and ultraviolet light (Mercury Arc lamp with different filters in the range of 0.1-0.8 mW.cm(-2)). This is the first report of using artificial sunlight to drive the photo-epoxidation of propylene. Over V-Ti/MCM-41 photocatalyst, the propylene oxide (PO) formation rate is 193.0 and 112.1 mu mol.gcat(-1).h(-1) with a PO selectivity of 35.0 and 53.7% under UV light and artificial sunlight, respectively. A normalized light utilization (NLU) index is defined and found to correlate well with the rate of both PO formation and C3H6 consumption in log-log scale. The light utilization with a mercury arc lamp is better than with a xenon lamp. The selectivity to PO remains practically unchanged with respect to NLU, suggesting that the photo-epoxidation occurs through the same mechanism under the conditions tested in this study.
URI: http://dx.doi.org/10.3762/bjnano.5.67
http://hdl.handle.net/11536/24194
ISSN: 2190-4286
DOI: 10.3762/bjnano.5.67
期刊: BEILSTEIN JOURNAL OF NANOTECHNOLOGY
Volume: 5
Issue: 
起始頁: 566
結束頁: 576
顯示於類別:期刊論文


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  1. 000335255900001.pdf