標題: Monitoring defects in IC fabrication using a hotelling T-2 control chart
作者: Tong, LI
Wang, CH
Huang, CL
工業工程與管理學系
Department of Industrial Engineering and Management
關鍵字: C chart;defect;defect clustering;integrated circuits (IC);hotelling T-2 control chart;wafer
公開日期: 1-二月-2005
摘要: Monitoring the wafer defects in integrated circuit (IC) fabrication is essential for enhancing wafer yield. However, significant defect clustering occurs when the wafer is large, so the conventional defect control chart, based on the Poisson distribution, is inappropriate. Defect clustering must also be analyzed to monitor effectively defects in ICI fabrication process control. This study developed a novel procedure using the multivariate Hotelling T-2 control chart, based on the number of defects and the defect clustering index (CI) to monitor simultaneously the number of defects and the defect clusters. The CI does,not require any statistical assumptions concerning the distribution of defects and can accurately evaluate the clustering phenomena. A case study of a Taiwanese IC manufacturer demonstrates the effectiveness of the proposed procedure.
URI: http://dx.doi.org/10.1109/TSM.2004.836659
http://hdl.handle.net/11536/23788
ISSN: 0894-6507
DOI: 10.1109/TSM.2004.836659
期刊: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume: 18
Issue: 1
起始頁: 140
結束頁: 147
顯示於類別:期刊論文


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  1. 000226791600018.pdf