標題: Nanotribological behavior of ZnO films prepared by atomic layer deposition
作者: Wang, Wun-Kai
Wen, Hua-Chiang
Cheng, Chun-Hu
Chou, Wu-Ching
Yau, Wei-Hung
Hung, Ching-Hua
Chou, Chang-Pin
機械工程學系
電子物理學系
Department of Mechanical Engineering
Department of Electrophysics
關鍵字: Thin films;Vapor deposition;Mechanical properties
公開日期: 1-三月-2014
摘要: We used atomic layer deposition to form ZnO thin-film coatings on Si substrates and then evaluate the effect of pile-up using the nanoscratch technique under a ramped mode. The wear volume decreased with increasing annealing temperature from room temperature to 400 degrees C for a given load. Elastic-to-plastic deformation occurred during sliding scratch processing between the groove and film for loading penetration of 30 nm. The onset of non-elastic behavior and greater contact pressure were evident for loading penetration of 150 nm; thus, full plastic deformation occurred as a result of a substrate effect. We suspect that elastic-plastic failure events were related to edge bulging between the groove and film, with elastic-plastic deformation attributable to adhesion discontinuities and/or cohesion failure of the ZnO films. (C) 2013 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.jpcs.2013.09.016
http://hdl.handle.net/11536/23573
ISSN: 0022-3697
DOI: 10.1016/j.jpcs.2013.09.016
期刊: JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
Volume: 75
Issue: 3
起始頁: 334
結束頁: 338
顯示於類別:期刊論文


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