標題: Optical Properties of AlxOy/Ni/AlxOy Multilayered Absorber Coatings Prepared by Reactive DC Magnetron Sputtering
作者: Tsai, T. K.
Hsueh, S. J.
Fang, J. S.
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: AlxOy/Ni/AlxOy;multilayered absorber coating;sputtering;absorptance;thermal emittance
公開日期: 1-一月-2014
摘要: Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings were deposited on stainless-steel substrates using reactive direct-current (DC) magnetron sputtering. Al (x) O (y) films with different morphologies, structures, and optical transmittances were obtained by varying the DC power and oxygen flux. The Al (x) O (y) films were characterized using field-emission scanning electron microscopy, transmission electron microscopy, energy-dispersive x-ray spectrometry, grazing-incidence x-ray diffraction, and ultraviolet/visible/near-infrared spectrophotometry. The effect of the thickness of the Al (x) O (y) films on the optical properties of Al (x) O (y) /Ni/Al (x) O (y) coatings was also investigated. Experimental results show that the thermal emittance of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings decreases as the thickness of the Al (x) O (y) top layer is decreased. The Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating with 70-nm-thick Al (x) O (y) top and bottom layers showed the best optical properties. The thermal stability of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating in which the Al (x) O (y) films were deposited at conditions of 150 W and 8 sccm O-2 was at least 12 h when the multilayered absorber was annealed at 400A degrees C in air.
URI: http://dx.doi.org/10.1007/s11664-013-2829-z
http://hdl.handle.net/11536/23392
ISSN: 0361-5235
DOI: 10.1007/s11664-013-2829-z
期刊: JOURNAL OF ELECTRONIC MATERIALS
Volume: 43
Issue: 1
起始頁: 229
結束頁: 235
顯示於類別:期刊論文


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