標題: Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
作者: Huijben, M.
Yu, P.
Martin, L. W.
Molegraaf, H. J. A.
Chu, Y. -H.
Holcomb, M. B.
Balke, N.
Rijnders, G.
Ramesh, R.
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: exchange bias;interface;oxide heterostructure;multiferroic;ferromagnet
公開日期: 14-九月-2013
URI: http://dx.doi.org/10.1002/adma.201300940
http://hdl.handle.net/11536/23319
ISSN: 0935-9648
DOI: 10.1002/adma.201300940
期刊: ADVANCED MATERIALS
Volume: 25
Issue: 34
起始頁: 4739
結束頁: 4745
顯示於類別:期刊論文


文件中的檔案:

  1. 000327692100014.pdf