標題: The metal grating design of plasmonic hybrid III-V/Si evanescent lasers
作者: Hsu, Min-Hsiang
Lin, Chien-Chung
Kuo, Hao-Chung
光電系統研究所
Institute of Photonic System
公開日期: 26-八月-2013
摘要: A hybrid III-V/silicon laser design with a metal grating layer inserted in between is proposed and numerically studied. The metal grating layer is buried in a silicon ridge waveguide surrounded by silicon dioxide, and its structural parameters such as periodicity, width and depth can be varied for optimization purpose. The plasmonic effect originated from the grating layer can manage optical fields between III-V and silicon layers in hopes of dimension reduction. The substrate is planarized to minimize the bonding failure. A numerical algorithm with various combinations of metal grating and waveguide structural parameters was created and the optimal design with 730 nm grating period and 600 nm of buried waveguide ridge height was obtained by minimizing the corresponding laser threshold. With top AlInGaAs quantum wells and optimized design of hybrid metal/silicon waveguide, a 0.6 mu m(-1) threshold gain can be achieved. (C)2013 Optical Society of America
URI: http://dx.doi.org/10.1364/OE.21.020210
http://hdl.handle.net/11536/22542
ISSN: 1094-4087
DOI: 10.1364/OE.21.020210
期刊: OPTICS EXPRESS
Volume: 21
Issue: 17
起始頁: 20210
結束頁: 20219
顯示於類別:期刊論文


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