標題: Highly textured ZnO:B films grown by low pressure chemical vapor deposition for efficiency enhancement of heterojunction silicon-based solar cells
作者: Hsiao, Jui-Chung
Chen, Chien-Hsun
Yang, Hung-Jen
Wu, Chien-Liang
Fan, Chia-Ming
Huang, Chien-Fu
Lin, Chao-Cheng
Yu, Peichen
Hwang, Jenn-Chang
光電工程學系
Department of Photonics
關鍵字: ZnO:B;Heterojunction solar cell;Low-pressure chemical-vapor-deposition
公開日期: 1-Sep-2013
摘要: This paper demonstrates the growth of highly-textured boron-doped ZnO (ZnO:B) film by using low-pressure chemical-vapor-deposition (LPCVD) for efficient light harvesting and carrier collection in heterojunction silicon-based (HJS) solar cells. The optical and electrical characteristics have been optimized versus the substrate temperature and B2H6 flow rate for tradeoffs among the sheet resistance, free-carrier absorption, and optical transmission of blue/green wavelengths. A HJS solar cell with a 1.6-mu m-thick ZnO:B film achieves a high power conversion efficiency of 16.30% and fill factor of 78.05%, compared to 15.64% and 72.17%, respectively, from a counterpart with a conventional 80-nm-thick indium tin oxide layer. (C) 2013 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.jtice.2013.01.027
http://hdl.handle.net/11536/22535
ISSN: 1876-1070
DOI: 10.1016/j.jtice.2013.01.027
期刊: JOURNAL OF THE TAIWAN INSTITUTE OF CHEMICAL ENGINEERS
Volume: 44
Issue: 5
起始頁: 758
結束頁: 761
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