標題: Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering
作者: Jian, Sheng-Rui
Chang, Huang-Wei
Tseng, Yu-Chin
Chen, Ping-Han
Juang, Jenh-Yih
電子物理學系
Department of Electrophysics
關鍵字: BiFeO3 thin films;XRD;AFM;Nanoindentation;Hardness
公開日期: 25-Jun-2013
摘要: The nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350A degrees C and 450A degrees C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall-Petch equation.
URI: http://dx.doi.org/10.1186/1556-276X-8-297
http://hdl.handle.net/11536/22279
ISSN: 1931-7573
DOI: 10.1186/1556-276X-8-297
期刊: NANOSCALE RESEARCH LETTERS
Volume: 8
Issue: 
結束頁: 
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