Title: Formation of Nanostructured Fullerene Interlayer through Accelerated Self-Assembly and Cross-Linking of Trichlorosilane Moieties Leading to Enhanced Efficiency of Photovoltaic Cells
Authors: Liang, Wei-Wei
Chang, Chih-Yu
Lai, Yu-Ying
Cheng, Sheng-Wen
Chang, Huan-Hsuan
Lai, Yin-Yu
Cheng, Yen-Ju
Wang, Chien-Lung
Hsu, Chain-Shu
Department of Applied Chemistry
Issue Date: 25-Jun-2013
Abstract: A new cross-linkable fullerene material, bis(2-(trichlorosilyl)propyl)-malonate C-60 (TSMC), functionalized with two trichlorosilane groups, was easily synthesized by Pt-catalyzed olefin hydrosilylation. By making use of facile hydrolysis of the trichlorosilyl moieties, TSMC can be spontaneously self-assembled and cross-linked on the TiOx surface by a simple spin-coating processing without the aid of photoirradiation or post-thermal treatments. The rapid formation of self-assembled and crosslinked TSMC (SA-C-TSMC) effectively passivates the residual hydroxyl groups on the TiOx surface. More significantly, the solvent-resistant TSMC network features a nanostructured surface to provide extra charge-generating interfacial area and straight electron transport pathways. The device (ITO/TiOx/SA-C-TSMC/P3HT:PC61BM (1:1, w/w)/PEDOT:PSS/Ag) with this C-60 interlayer exhibited an efficiency of 3.9% which greatly outperformed the device without this layer. Furthermore, the strategy can also be effectively applied to the device (ITO/TiOx/PDITTDTBT:PC71BM(1:4, w/w)/MoOx/Ag) incorporating a conjugated polymer, poly(diindenothiophene-alt-dithienylbenzothiadizole) copolymer (PDITTDTBT). This device delivered a high efficiency of 5.8% which represents a 35% enhancement over the device without SA-C-TSMC. This new generation of trichlorosilane-based fullerene offers an easy and accelerated processing technique to produce efficient and cost-effective inverted solar cells.
URI: http://dx.doi.org/10.1021/ma400290x
ISSN: 0024-9297
DOI: 10.1021/ma400290x
Volume: 46
Issue: 12
Begin Page: 4781
End Page: 4789
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