標題: Stability and etching of titanium oxynitride films in hydrogen microwave plasma
作者: Do, Hien
Yen, Tzu-Chun
Chang, Li
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-七月-2013
摘要: Epitaxial titanium oxynitride (TiNO) films deposited on MgO by pulsed laser deposition were treated in hydrogen microwave plasma. Scanning electron microscopy and x-ray photoelectron spectroscopy were used to examine the stability and etching of TiNO which strongly depended on hydrogen gas pressure. TiNO was very chemically stable and remained with good crystallinity under hydrogen pressure below 5300 Pa. With increase of pressure, it may lead to the formation of etch pits in inverse pyramid shape. The etch mechanism as well as the effects of gas pressure and etching time are also presented. (C) 2013 American Vacuum Society.
URI: http://dx.doi.org/10.1116/1.4811676
http://hdl.handle.net/11536/22240
ISSN: 0734-2101
DOI: 10.1116/1.4811676
期刊: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume: 31
Issue: 4
結束頁: 
顯示於類別:期刊論文


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