標題: Enhancement of Open-Circuit Voltage Using CF4 Plasma Treatment on Nitric Acid Oxides
作者: Lin, Je-Wei
Wu, Chien-Hung
Wu, Sheng-Wei
Hseih, Wei-Ping
Du, Chen-Hsu
Chao, Tien-Sheng
電子物理學系
Department of Electrophysics
關鍵字: CF4 plasma;low-temperature oxides;open-circuit voltage;surface passivation
公開日期: 1-五月-2013
摘要: Surface passivation of solar cells is investigated using CF4 plasma treatment on low-temperature oxides to enhance the open-circuit voltage of the solar cells. Low-temperature oxides grown by a nitric acid solution are treated with the CF4 plasma. Solar cells undergoing this scheme show an improved performance, including low-saturation current density and good quantum efficiency at short wavelengths. Experimental results demonstrate that the CF4 plasma pretreatment on low-temperature oxides can significantly improve the open-circuit voltage, short-circuit current, and fill factor for silicon wafer-based solar cells. This technique is very promising for in-line solar cell manufacturing.
URI: http://dx.doi.org/10.1109/LED.2013.2253757
http://hdl.handle.net/11536/21907
ISSN: 0741-3106
DOI: 10.1109/LED.2013.2253757
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 34
Issue: 5
起始頁: 665
結束頁: 667
顯示於類別:期刊論文


文件中的檔案:

  1. 000318433400031.pdf