標題: Using SiOx nano-films to enhance GZO Thin films properties as front electrodes of a-Si solar cells
作者: Chang, Kow-Ming
Ho, Po-Ching
Yu, Shu-Hung
Hsu, Jui-Mei
Yang, Kuo-Hui
Wu, Chin-Jyi
Chang, Chia-Chiang
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Atmospheric pressure plasma;Light-trapping effect;Transparent conductive oxide
公開日期: 1-七月-2013
摘要: One of the essential applications of transparent conductive oxides is as front electrodes for superstrate silicon thin-film solar cells. Textured TCO thin films can improve absorption of sunlight for an a-Si:H absorber during a single optical path. In this study, high-haze and low-resistivity bilayer GZO/SiOx thin films prepared using an atmospheric pressure plasma jet (APPJ) deposition technique and dc magnetron sputtering. The silicon subdioxide nano-film plays an important role in controlling the haze value of subsequent deposited GZO thin films. The bilayer GZO/SiOx (90 sccm) sample has the highest haze value (22.30%), the lowest resistivity (8.98 x 10(-4) Omega cm), and reaches a maximum cell efficiency of 6.85% (enhanced by approximately 19% compared to a sample of non-textured GZO). (c) 2013 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.apsusc.2013.03.165
http://hdl.handle.net/11536/21838
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2013.03.165
期刊: APPLIED SURFACE SCIENCE
Volume: 276
Issue: 
起始頁: 756
結束頁: 760
顯示於類別:期刊論文


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