Title: Using SiOx nano-films to enhance GZO Thin films properties as front electrodes of a-Si solar cells
Authors: Chang, Kow-Ming
Ho, Po-Ching
Yu, Shu-Hung
Hsu, Jui-Mei
Yang, Kuo-Hui
Wu, Chin-Jyi
Chang, Chia-Chiang
Department of Electronics Engineering and Institute of Electronics
Keywords: Atmospheric pressure plasma;Light-trapping effect;Transparent conductive oxide
Issue Date: 1-Jul-2013
Abstract: One of the essential applications of transparent conductive oxides is as front electrodes for superstrate silicon thin-film solar cells. Textured TCO thin films can improve absorption of sunlight for an a-Si:H absorber during a single optical path. In this study, high-haze and low-resistivity bilayer GZO/SiOx thin films prepared using an atmospheric pressure plasma jet (APPJ) deposition technique and dc magnetron sputtering. The silicon subdioxide nano-film plays an important role in controlling the haze value of subsequent deposited GZO thin films. The bilayer GZO/SiOx (90 sccm) sample has the highest haze value (22.30%), the lowest resistivity (8.98 x 10(-4) Omega cm), and reaches a maximum cell efficiency of 6.85% (enhanced by approximately 19% compared to a sample of non-textured GZO). (c) 2013 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.apsusc.2013.03.165
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2013.03.165
Volume: 276
Begin Page: 756
End Page: 760
Appears in Collections:Articles

Files in This Item:

  1. 000318979800108.pdf