標題: Switching Mode and Mechanism in Binary Oxide Resistive Random Access Memory Using Ni Electrode
作者: Lin, Kuan-Liang
Hou, Tuo-Hung
Lee, Yao-Jen
Chang, Jhe-Wei
Lin, Jun-Hung
Shieh, Jiann
Chou, Cheng-Tung
Lei, Tan-Fu
Chang, Wen-Hsiung
Jang, Wen-Yueh
Lin, Chen-Hsi
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-三月-2013
摘要: Resistive-switching (RS) modes in different CMOS-compatible binary oxides have been shown to be governed by the interplay with the Ni top electrode. Unipolar RS and metallic low-resistance state in polycrystalline HfO2 and ZrO2 are distinct from the preferential bipolar RS and semiconductive low-resistance state in amorphous Al2O3 and SiO2. Backside secondary ion mass spectrometry (SIMS) has shown the formation of Ni filaments in HfO2, in contrast to the formation of oxygen-vacancy filaments in Al2O3. The differences have been explained by strong dependence of Ni migration on the oxide crystallinity. Additionally, the RS mode can be further tailored using bilayer structures. The oxide layer next to the Si bottom electrode and its tendency of forming Ni filaments play significant roles in unipolar RS in the bilayer structures, in support of the conical-shape Ni filament model where the connecting and rupture of filaments for unipolar RS occur at the smallest diameter near the bottom electrodes. (c) 2013 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.7567/JJAP.52.031801
http://hdl.handle.net/11536/21418
ISSN: 0021-4922
DOI: 10.7567/JJAP.52.031801
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 52
Issue: 3
結束頁: 
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