標題: Ultralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layers
作者: Ravipati, Srikanth
Shieh, Jiann
Ko, Fu-Hsiang
Yu, Chen-Chieh
Chen, Hsuen-Li
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: ultralow reflection;absorption;heterostructures;black materials
公開日期: 25-Mar-2013
摘要: A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.
URI: http://dx.doi.org/10.1002/adma.201204235
http://hdl.handle.net/11536/21374
ISSN: 0935-9648
DOI: 10.1002/adma.201204235
期刊: ADVANCED MATERIALS
Volume: 25
Issue: 12
起始頁: 1724
結束頁: 1728
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