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dc.contributor.authorRay, Sounak K.en_US
dc.contributor.authorPanda, Debashisen_US
dc.contributor.authorAluguri, Rakeshen_US
dc.date.accessioned2014-12-08T15:29:44Z-
dc.date.available2014-12-08T15:29:44Z-
dc.date.issued2013-04-01en_US
dc.identifier.issn1745-8080en_US
dc.identifier.urihttp://dx.doi.org/10.1080/17458080.2012.708440en_US
dc.identifier.urihttp://hdl.handle.net/11536/21363-
dc.description.abstractNickel nanocrystals (NCs) embedded flash memory structure with SiO2 tunnelling and pulsed laser deposition grown Al2O3 blocking oxide is reported here. The post-deposition thermal annealing of an ultrathin (approximate to 5nm) nickel film evaporated on thermally grown SiO2 tunnelling barrier has been performed to form the nickel NCs. The formation of tiny nickel NCs is confirmed from the high-resolution transmission electron microscope micrographs. The electrical capacitancevoltage (CV) characteristics of the optimised 1000 degrees C, 5min annealed sample shows a large memory window of 20V at +/- 20V sweeping voltage. The charge storage properties are found to be significantly improved as compared to control samples. The frequency dependent CV measurements indicate the dominant charge trapping in Ni NCs, making the memory structure attractive for use in future nanoscale high-performance applications.en_US
dc.language.isoen_USen_US
dc.subjectnon-volatile flash memoryen_US
dc.subjectnickel nanocrystalsen_US
dc.subjectPLDen_US
dc.subjectelectrical measurementen_US
dc.subjectlarge memoryen_US
dc.titleEnhanced charge storage characteristics of nickel nanocrystals embedded flash memory structuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1080/17458080.2012.708440en_US
dc.identifier.journalJOURNAL OF EXPERIMENTAL NANOSCIENCEen_US
dc.citation.volume8en_US
dc.citation.issue3en_US
dc.citation.spage389en_US
dc.citation.epage395en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000315675800019-
dc.citation.woscount0-
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