標題: Transfer of a continuous-relief lenticular array onto a quartz substrate by using SIL combined with the dry-etching method
作者: Deng, Qing-Long
Chen, Chien-Yue
Lin, Wei-Li
Shew, Bor-Yuan
Chiang, Donyau
Tang, Yu-Hsiang
Lin, Bor-Shyh
光電系統研究所
影像與生醫光電研究所
Institute of Photonic System
Institute of Imaging and Biomedical Photonics
公開日期: 1-三月-2013
摘要: This study presents the technological process for producing a lenticular array on quartz. With scanning immersion lithography used to define the 3D lenticular array structure on a quartz substrate, inductively coupled plasma-reactive ion etching (ICP-RIE) is able to directly etch the structure. Based on the surface measurement, ICP-RIE can completely etch the surface structure onto the quartz substrate, and the surface roughness can reach 30 nm. Furthermore, after the optical measurement of stereoscopic images, the left and the right stereoscopic images can be successfully transmitted to the corresponding places without crosstalk and with a splitting efficiency close to 80%. As a result, this technology allows for the production of a lenticular structure with various changes on the quartz surface.
URI: http://dx.doi.org/10.1088/0960-1317/23/3/035021
http://hdl.handle.net/11536/21197
ISSN: 0960-1317
DOI: 10.1088/0960-1317/23/3/035021
期刊: JOURNAL OF MICROMECHANICS AND MICROENGINEERING
Volume: 23
Issue: 3
結束頁: 
顯示於類別:期刊論文


文件中的檔案:

  1. 000314816800022.pdf