標題: A Novel Design Flow for Dummy Fill Using Boolean Mask Operations
作者: Luo, Tseng-Chin
Chao, Mango C. -T.
Fisher, Philip A.
Kuo, Chun-Ren
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Boolean operation;dummy fill
公開日期: 1-Aug-2012
摘要: Dummy fill has been demonstrated to be an effective technique to reduce process variation and improve manufacturability for advanced integrated circuit (IC) designs. However, the computation load, often several days for a realistic IC design, is a significant portion of the cycle time for delivering first silicon on new or modified designs. In this paper, we propose a novel design flow and dummy-fill algorithm based on Boolean operations, which greatly improves computational efficiency and pattern density uniformity, and enables dummy generation to be combined with the mask-preparation Boolean operations performed by the mask-fabrication facility. Mask data preparation can be performed in parallel with dummy generation and post-dummy simulation checks at the design house, resulting in improved first-silicon cycle time. Experimental results demonstrate these benefits in the context of an advanced foundry process technology.
URI: http://dx.doi.org/10.1109/TSM.2012.2190431
http://hdl.handle.net/11536/21120
ISSN: 0894-6507
DOI: 10.1109/TSM.2012.2190431
期刊: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume: 25
Issue: 3
起始頁: 468
結束頁: 479
Appears in Collections:Conferences Paper


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