標題: Sapphire surface patterning using femtosecond laser micromachining
作者: Chang, Cho-Wei
Chen, Chien-Yu
Chang, Tien-Li
Ting, Chia-Jen
Wang, Chien-Ping
Chou, Chang-Pin
機械工程學系
電子工程學系及電子研究所
Department of Mechanical Engineering
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-十一月-2012
摘要: This study presents an alternative method for micron-resolution patterning of a sapphire surface utilizing the characteristic of an ultra-short pulse (10(-15) s) from ytterbium (Yb) femtosecond laser (FS-laser) irradiation. Conventional processes often involve several steps, such as wet chemical or dry etching, for surface structuring of sapphire. In this study, two-dimensional array patterns on the sapphire surface with an area of 5x5 mm(2) and a depth of 1.2 +/- 0.1 mu m can be directly and easily fabricated by a single step of the FS-laser process, which involves 350-fs laser pulses with a wavelength of 517 nm at a repetition rate of 100 kHz. The measured ablation depths on the sapphire surface display that the proposed process can be under well-controlled conditions. Based on the design changes for being quickly implemented in the micromachining process, a FS laser can be a promising and competitive tool for patterning sapphire with an acceptable quality for industrial usage.
URI: http://dx.doi.org/10.1007/s00339-012-7048-6
http://hdl.handle.net/11536/20401
ISSN: 0947-8396
DOI: 10.1007/s00339-012-7048-6
期刊: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume: 109
Issue: 2
起始頁: 441
結束頁: 448
顯示於類別:期刊論文


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  1. 000310240900028.pdf