標題: Nanomechanical characteristics of annealed Si/SiGe superlattices
作者: Wu, Ming-Jhang
Wen, Hua-Chiang
Wu, Shyh-Chi
Yang, Ping-Feng
Lai, Yi-Shao
Hsu, Wen-Kuang
Wu, Wen-Fa
Chou, Chang-Pin
機械工程學系
Department of Mechanical Engineering
關鍵字: Superlattices;Ultrahigh-vacuum chemical vapor deposition;Atomic force microscopy;Transmission electron microscopy
公開日期: 15-八月-2011
摘要: In this study, the nanomechanical damage was investigated on the annealed Si/SiGe strained-layer superlattices (SLSs) deposited using an ultrahigh-vacuum chemical vapor deposition (UHVCVD). Nanoscratch, nanoindenter, atomic force microscopy (AFM), and transmission electron microscopy (TEM) techniques were used to determine the nanomechanical behavior of the SiGe films. With a constant force applied, greater hardness number and larger coefficients of friction (mu) were observed on the samples that had been annealed at 600 degrees C, suggesting that annealing of the Si/SiGe SLSs can induce greater shear resistance. AFM morphological studies of the Si/SiGe SLSs revealed that pile-up phenomena occurred on both sides of each scratch, with the formation of some pellets and microparticles. The Si/SiGe SLSs that had been subjected to annealing under various conditions exhibited significantly different features in their indentation results. Indeed, the TEM images reveal slight dislocation propagation in the microstructures. Thus, the hardness and elastic modulus can be increased slightly after annealing treatment because the existence of comparatively unstable microstructures. It is suggested that cracking phenomena dominate the damage cause of Si/SiGe SLSs. (C) 2011 Elsevier B. V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.apsusc.2011.05.015
http://hdl.handle.net/11536/20323
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2011.05.015
期刊: APPLIED SURFACE SCIENCE
Volume: 257
Issue: 21
起始頁: 8887
結束頁: 8893
顯示於類別:期刊論文


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