|標題:||Influence of Oxygen Concentration on Resistance Switching Characteristics of Gallium Oxide|
Sze, Simon M.
Department of Electronics Engineering and Institute of Electronics
|關鍵字:||Gallium oxide;nonvolatile resistance switching memory;resistance random access memory (RRAM)|
|摘要:||In this letter, we fabricated resistance random access memory in a Pt/GaOx/TiN structure with a bipolar resistance switching characteristic and a bistable resistance ratio of about two orders by I-V sweeping. In order to increase the oxygen ion quantity in the gallium oxide layer, the proposed sample was sputtered in a mixed ambient of Ar and oxygen, and the resistance ratio was enhanced by 2.5 orders. In addition to the resistance ratio, set voltage distribution statistics show that the stability of gallium oxide sputtered in mixed Ar and oxygen gas was better than standard Ar-only sample.|
|期刊:||IEEE ELECTRON DEVICE LETTERS|
|Appears in Collections:||Articles|
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