標題: SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM
作者: LOONG, WA
SHY, SL
GUO, GC
CHOU, YL
應用化學系
Department of Applied Chemistry
公開日期: 1994
URI: http://hdl.handle.net/11536/20163
http://dx.doi.org/10.1117/12.167280
ISBN: 0-8194-1356-9
DOI: 10.1117/12.167280
期刊: 13TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
Volume: 2087
起始頁: 380
結束頁: 389
Appears in Collections:Conferences Paper


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  1. A1994BZ89N00038.pdf