標題: CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS
作者: WANG, CK
YING, TL
WEI, CS
LIU, LM
CHENG, HC
LIN, MS
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: PE-SIN;UV-TRANSMITTANCE;EPROM
公開日期: 1994
URI: http://hdl.handle.net/11536/20116
http://dx.doi.org/10.1117/12.186067
ISBN: 0-8194-1668-1
DOI: 10.1117/12.186067
期刊: MICROELECTRONICS TECHNOLOGY AND PROCESS INTEGRATION
Volume: 2335
起始頁: 282
結束頁: 290
顯示於類別:會議論文


文件中的檔案:

  1. A1994BB55A00030.pdf