標題: SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
作者: LOONG, WA
YEH, CH
SHY, SL
應用化學系
Department of Applied Chemistry
關鍵字: PHASE-SHIFTING MASK;HALF-TONE;RIM;HALF-TONE-RIM;SIMULATION;OFF-AXIS ILLUMINATION;SUBMICRON LITHOGRAPHY
公開日期: 1995
URI: http://hdl.handle.net/11536/19976
http://dx.doi.org/10.1117/12.209275
ISBN: 0-8194-1788-2
DOI: 10.1117/12.209275
期刊: OPTICAL/LASER MICROLITHOGRAPHY VIII
Volume: 2440
起始頁: 448
結束頁: 457
Appears in Collections:Conferences Paper


Files in This Item:

  1. A1995BD19S00039.pdf