標題: Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 mu m
作者: Ku, TK
Hsieh, BB
Chen, MS
Wang, CC
Wang, PW
Hsieh, IJ
Cheng, HC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: oxidation sharpening;microtips;gated field emitter arrays;silicon pedestal;gate aperture;field emission
公開日期: 1995
URI: http://hdl.handle.net/11536/19968
http://dx.doi.org/10.1117/12.220935
ISBN: 0-8194-2007-7
DOI: 10.1117/12.220935
期刊: MICROELECTRONIC STRUCTURES AND MICROELECTROMECHANICAL DEVICES FOR OPTICAL PROCESSING AND MULTIMEDIA APPLICATIONS
Volume: 2641
起始頁: 140
結束頁: 144
Appears in Collections:Conferences Paper


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  1. A1995BE29Y00016.pdf