標題: EFFECTS OF SUBSTRATE-TEMPERATURE AND OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF SPUTTERED ZIRCONIUM TITANATE THIN-FILMS
作者: CHANG, DA
LIN, P
TSENG, TY
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: ZIRCONIUM TITANATE;RF MAGNETRON SPUTTERING;REFRACTIVE INDEX;EXTINCTION COEFFICIENT;CRYSTALLINITY PHASE
公開日期: 1-九月-1995
摘要: We report the effects of substrate temperature and O-2/Ar ratios on the properties of ZrTiO4 thin films prepared by RF magnetron sputtering. The films were deposited at a constant gas pressure (0.133 Pa) with various substrate temperatures (25-450 degrees C) and different O-2/Ar ratios from 0/100 to 20/80. The deposition rate decreases with increasing oxygen partial pressure and substrate temperature. Moreover, the higher O-2 content increases the surface roughness of deposited films, which reduces the transmittance of the films. The effects of substrate temperature and oxygen partial pressure on the stoichiometric composition, optical constant, crystallinity phase, surface morphology, and adhesion have also been systematically investigated.
URI: http://dx.doi.org/10.1143/JJAP.34.4854
http://hdl.handle.net/11536/1762
ISSN: 0021-4922
DOI: 10.1143/JJAP.34.4854
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 34
Issue: 9A
起始頁: 4854
結束頁: 4861
顯示於類別:期刊論文


文件中的檔案:

  1. A1995RX26800048.pdf