標題: Nanotribological behavior of thermal treatment of zinc titanate thin films
作者: Wu, Shyh-Chi
Yau, Wei-Hung
Tsai, Chien-Huang
Chou, Chang-Pin
機械工程學系
Department of Mechanical Engineering
關鍵字: radio frequency magnetron co-sputtering;friction;atomic force microscopy;X-ray photoelectron spectroscopy
公開日期: 1-十月-2012
摘要: We present a study of the nanotribological behavior of ZnTiO3 films; the surface morphology, stoichiometry, and friction (mu) were analyzed using atomic force microscopy, X-ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and mu of the ZnTiO3 films were in the range from 8.5?+/-?0.4 to 5.6?+/-?0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO3 decomposes into cubic Zn2TiO4 and rutile TiO2 based on the thermal treatment; the H, mu, and RMS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO3 films. From X-ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as-deposited films are mainly amorphous; however, the hexagonal ZnTiO3 phase was observed with the ZnTiO3 (104), (110), (116), and (214) peaks from 620 to 820 degrees C, indicating that there is highly (104)-oriented ZnTiO3 on the silicon substrate. Copyright (c) 2012 John Wiley & Sons, Ltd.
URI: http://dx.doi.org/10.1002/sia.5019
http://hdl.handle.net/11536/16834
ISSN: 0142-2421
DOI: 10.1002/sia.5019
期刊: SURFACE AND INTERFACE ANALYSIS
Volume: 44
Issue: 10
起始頁: 1314
結束頁: 1318
顯示於類別:期刊論文


文件中的檔案:

  1. 000308303100002.pdf