標題: A neural network-based procedure for the process monitoring of clustered defects in integrated circuit fabrication
作者: Su, CT
Tong, LI
工業工程與管理學系
Department of Industrial Engineering and Management
關鍵字: neural networks;clustering analysis;c chart;defect;cluster
公開日期: 1-十二月-1997
摘要: In integrated circuit (IC) fabrication, a wafer's defects tend to cluster. As the wafer size increases, the clustering phenomenon of the defects becomes increasingly apparent. When the conventional control chart (c chart) is used, the clustered defects frequently cause many false alarms. In this study, we propose a neural network-based procedure for the process monitoring of clustered defects in IC fabrication. The proposed procedure can reduce the phenomenon of the false alarms caused by the clustered defects. A case study is also presented to show the effectiveness of the proposed procedure. (C) 1997 Elsevier Science B.V.
URI: http://hdl.handle.net/11536/167
ISSN: 0166-3615
期刊: COMPUTERS IN INDUSTRY
Volume: 34
Issue: 3
起始頁: 285
結束頁: 294
顯示於類別:期刊論文


文件中的檔案:

  1. 000071610600004.pdf