標題: Ti/Pt/Ti/Cu-Metallized Interconnects for GaN High-Electron-Mobility Transistors on Si Substrate
作者: Lin, Yueh-Chin
Kuo, Tza-Yao
Chuang, Yu-Lin
Wu, Chien-Hua
Chang, Chia-Hua
Huang, Kuan-Ning
Chang, Edward Yi
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-六月-2012
摘要: Cu-metallized interconnects for GaN high-electron-mobility transistors (HEMTs) on Si substrate using a Pt/Cu diffusion barrier layer are investigated. Auger electron spectroscopy (AES) depth profiles indicate that the GaN/Au/Ti/Pt/Ti/Cu thin metal structure is thermally stable up to 350 degrees C. The Cu-metallized devices using the proposed metal scheme exhibited DC characteristics comparable to those of conventional Au-metallized GaN devices even after annealing at 350 degrees C for 30 min. No degradation in current with time was observed when the device was tested under 28 V high-voltage stress for 24 h at room temperature. These results indicate that the Cu-metallized airbridges with the Ti/Pt/Ti/Cu diffusion barrier layer can be used for GaN HEMT fabrication. (C) 2012 The Japan Society of Applied Physics
URI: http://dx.doi.org/066503
http://hdl.handle.net/11536/16515
ISSN: 1882-0778
DOI: 066503
期刊: APPLIED PHYSICS EXPRESS
Volume: 5
Issue: 6
結束頁: 
顯示於類別:期刊論文


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