標題: Measuring the Manufacturing Yield for Processes With Multiple Manufacturing Lines
作者: Tai, Y. T.
Pearn, W. L.
Kao, Chun-Min
統計學研究所
工業工程與管理學系
Institute of Statistics
Department of Industrial Engineering and Management
關鍵字: Capability index;lower confidence bound;multiple manufacturing lines;process yield
公開日期: 1-May-2012
摘要: Process yield is the most common criterion used in the semiconductor manufacturing industry for measuring process performance. In the globally competitive manufacturing environment, photolithography processes involving multiple manufacturing lines are quite common in the Science-Based Industrial Park in Hsinchu, Taiwan, due to economic scale considerations. In this paper, we develop an effective method for measuring the manufacturing yield for photolithography processes with multiple manufacturing lines. Exact distribution of the estimated measure is analytically intractable. We obtain a rather accurate approximation to the distribution. In addition, we tabulate the lower conference bounds based on the obtained approximated distributions for the convenience of industry applications. We also develop a decision-making method for process precision testing to determine whether a process meets the process yield requirement preset in the factory. For illustration purposes, an application example is included.
URI: http://hdl.handle.net/11536/16338
ISSN: 0894-6507
期刊: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume: 25
Issue: 2
結束頁: 284
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