標題: Threading Dislocation Blocking in Metamorphic InGaAs/GaAs for Growing High-Quality In0.5Ga0.5As and In0.3Ga0.7As on GaAs Substrate by Using Metal Organic Chemical Vapor Deposition
作者: Hong-Quan Nguyen
Chang, Edward Yi
Yu, Hung-Wei
Hai-Dang Trinh
Dee, Chang-Fu
Wong, Yuen-Yee
Hsu, Ching-Hsiang
Binh-Tinh Tran
Chung, Chen-Chen
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-五月-2012
摘要: High quality In0.3Ga0.7As and In0.51Ga0.49As epilayers have been successfully grown on the GaAs substrate by MOCVD. A cross-sectional study by transmission electron microscopy showed that the threading dislocations (TDs) have been successfully contained and limited within the buffer layers designed to stop the elongation of TDs into the In0.3Ga0.7As and In0.51Ga0.49As epilayers. A TD density of 1 x 10(6) cm(-2) in a fully relaxed In0.51Ga0.49As epilayer was achieved. The measurement of lifetimes of n- and p-type In0.51Ga0.49As has been done by using time-resolved photoluminescence. A great reduction in the number of recombination centers in the InGaAs epilayer has been shown. (c) 2012 The Japan Society of Applied Physics
URI: http://dx.doi.org/055503
http://hdl.handle.net/11536/16331
ISSN: 1882-0778
DOI: 055503
期刊: APPLIED PHYSICS EXPRESS
Volume: 5
Issue: 5
結束頁: 
顯示於類別:期刊論文


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