標題: Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition
作者: Chiou, Ai-Huei
Chang, Yu-Ming
Wu, Wen-Fa
Chou, Chang-Ping
Hsu, Chun-Yao
機械工程學系
Department of Mechanical Engineering
公開日期: 1-四月-2012
摘要: Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic.
URI: http://hdl.handle.net/11536/16069
ISSN: 0957-4522
期刊: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume: 23
Issue: 4
結束頁: 889
顯示於類別:期刊論文


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  1. 000302817400012.pdf