標題: Growth mode transition of atomic layer deposited Al2O3 on porous TiO2 electrodes of dye-sensitized solar cells
作者: Tien, Ta-Chang
Pan, Fu-Ming
Wang, Lih-Ping
Tsai, Feng-Yu
Lin, Ching
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Growth mode;Atomic layer deposition (ALD);Core/shell nanoparticle;Dye-sensitized solar cells
公開日期: 1-Jan-2012
摘要: This study investigates the growth behavior of atomic-layer-deposited (ALD) Al2O3 overlayers on porous TiO2 electrodes, which comprise an anatase nanoparticle layer and a rutile particle layer, for optimizing dye-sensitized solar cells. The growth mode of the AID Al2O3 overlayers changes from island growth to layer-by-layer growth during the first few MD reaction cycles, and the growth mode transition is much more pronounced for the anatase electrode layer. The transition is likely a result of the reduction in the contractive lattice strain of the TiO2 nanoparticles. The lattice strain in the hydroxylated TiO2 nanoparticles is progressively reduced during the ALD Al2O3 deposition, resulting in the growth mode transition. (c) 2011 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2011.08.057
http://hdl.handle.net/11536/15689
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.08.057
期刊: THIN SOLID FILMS
Volume: 520
Issue: 6
起始頁: 1745
結束頁: 1750
Appears in Collections:Articles


Files in This Item:

  1. 000300459200011.pdf