標題: Influence of oxygen flow rate on photocatalytic TiO2 films deposited by rf magnetron sputtering
作者: Chiou, A. H.
Kuo, C. G.
Huang, C. H.
Wu, W. F.
Chou, C. P.
Hsu, C. Y.
機械工程學系
Department of Mechanical Engineering
公開日期: 1-二月-2012
摘要: Titanium dioxide (TiO2) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron sputtering using a TiO2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 A degrees C and total gas pressure of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic activities of the TiO2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO2 thin films. The results showed that when the [O-2/(Ar + O-2)] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water contact angle after 9 min UV illumination was approximately 4.5A degrees, and the methylene blue (MB) solution decomposition from 12 down to 3.34 mu mol/L for 240 min UV irradiation.
URI: http://dx.doi.org/10.1007/s10854-011-0445-3
http://hdl.handle.net/11536/15667
ISSN: 0957-4522
DOI: 10.1007/s10854-011-0445-3
期刊: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume: 23
Issue: 2
起始頁: 589
結束頁: 594
顯示於類別:期刊論文


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