標題: Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
作者: Lin, Meng-Yu
Sheng, Yung-Shuan
Chen, Shu-Han
Su, Ching-Yuan
Li, Lain-Jong
Lin, Shih-Yen
光電工程學系
Department of Photonics
關鍵字: annealing;carbon;electrical resistivity;precipitation;sputter deposition;thin films
公開日期: 1-Nov-2011
摘要: An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 degrees C, a sheet resistance of 1.36 x 10(4) Omega/square can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3646481]
URI: http://dx.doi.org/10.1116/1.3646481
http://hdl.handle.net/11536/15376
ISSN: 1071-1023
DOI: 10.1116/1.3646481
期刊: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume: 29
Issue: 6
結束頁: 
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