標題: Moisture uptake and dielectric property of methylsilsesquioxane/high-temperature porogen hybrids and porous low-k films
作者: Che, Mu-Lung
Teng, Jun-Yuan
Lai, Po-Cheng
Leu, Jihperng
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-十二月-2011
摘要: Two high-temperature pore generators (porogens) have been used to study the effect of porogen structure on moisture uptake and k-value in methylsilsesquioxane/porogen hybrid films and their corresponding porous films in a postintegration porogen removal scheme. Poly(styrene-b-4-vinylpyridine) containing di-block structure and pyridine polar group leads to higher moisture uptake and k-value in the hybrid films as compared to poly(styrene-block-butadiene-block-styrene) with symmetrical structure and nonpolar groups. Moreover, the moisture uptake behavior in both as-prepared hybrid films is in physical sorption mode based on their reversible adsorption-desorption curve measured by quartz crystal microbalance. After porogen removal, the k-values of porous films are favorably not influenced by porogen structures, and their moisture uptake is as low as 1.78 wt% even at 40 vol.% porosity. However, based on the simulation of the modified-Rayleigh model, the porous films are found to possess 0.4 vol.% chemisorbed moisture on the pore surface, resulting in 17-23% deviation from the ideal k-values.
URI: http://dx.doi.org/10.1557/jmr.2011.384
http://hdl.handle.net/11536/15365
ISSN: 0884-2914
DOI: 10.1557/jmr.2011.384
期刊: JOURNAL OF MATERIALS RESEARCH
Volume: 26
Issue: 23
起始頁: 2987
結束頁: 2995
顯示於類別:期刊論文


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