標題: Preparation of polyhedral oligomeric silsesquioxane-containing block copolymer with well-controlled stereoregularity
作者: Tsai, Sung-Yu
Kuretani, Satoshi
Manabe, Kei
Terao, Toshiki
Komamura, Takahiro
Agata, Yoshihiro
Ohta, Noboru
Fujii, Syuji
Nakamura, Yoshinobu
Wang, Chien-Lung
Hayakawa, Teruaki
Hirai, Tomoyasu
應用化學系
Department of Applied Chemistry
關鍵字: anionic polymerization;block copolymers;self-assembly
公開日期: 1-Jan-1970
摘要: Preparation of functional domains with a spacing of 10 nm is a benchmark set to fabricate next-generation electronic devices. Organic-inorganic block copolymers form well-ordered microphase separations with very small domain sizes. The design and preparation of a novel block copolymer consisting of syndiotactic polymethyl methacrylate (st-PMMA) and polyhedral oligomeric silsesquioxane (POSS)-functionalized polymethacrylate, designated as st-PMMA-b-PMAPOSS, which can recognize functional molecules, are reported. The st-PMMA segments form a helical structure and encapsulate C-60 in the helical nanocavity, leading to the formation of an inclusion complex. Although the ordering of the domains is not high, C-60 domains that are in a quasi-equilibrium state, with about 10-nm domain spacings, are generated using st-PMMA-b-PMAPOSS that can recognize functional molecules. (c) 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019
URI: http://dx.doi.org/10.1002/pola.29498
http://hdl.handle.net/11536/152803
ISSN: 0887-624X
DOI: 10.1002/pola.29498
期刊: JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
起始頁: 0
結束頁: 0
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